The deposition of metal nanoparticles can be achieved through various methods, each with distinct advantages and limitations concerning the rate of deposition. Here's a comparison of some commonly used methods based on the rate of deposition:
### 1. **Chemical Vapor Deposition (CVD)**
- **Rate of Deposition**: Moderate to high.
- **Description**: In CVD, metal precursors are vaporized and then chemically reacted to form solid nanoparticles


