Deposition of aluminum nanoparticles can be achieved through several techniques, depending on the desired application, substrate, and required properties. Here are some common methods for depositing aluminum nanoparticles:
1. **Chemical Vapor Deposition (CVD)**:
- **Process**: In CVD, gaseous precursors are used to deposit a solid aluminum film on a substrate. Precursors like aluminum chloride (AlCl3) or organoaluminum compounds can be used.


